THERMODYNAMICS OF ALN DEPOSITION BY MEANS OF ALUMINIUM-TRICHLORIDE-AMMONIA PROCESS

被引：11

作者：

ARNOLD, H ^{[1
]}

BISTE, L ^{[1
]}

KAUFMANN, T ^{[1
]}

机构：

[1] VEB ELEKTROGLAS ILMENAU,BETRIEB KOMBINAT VEB MIKROELEKTRON,DDR-63 ILMENAU,GER DEM REP

来源：

KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY | 1978年 / 13卷 / 08期

关键词：

D O I：

10.1002/crat.19780130808

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：929 / 937

页数：9

共 24 条

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