THERMODYNAMICAL ANALYSES AND EXPERIMENTS FOR PREPARATION OF SILICON NITRIDE

被引:12
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ARIZUMI, T
NISHINAGA, T
OGAWA, H
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10.1143/JJAP.7.1021
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O59 [应用物理学];
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页码:1021 / +
页数:1
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共 7 条
[1]   SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM [J].
BEAN, KE ;
GLEIM, PS ;
YEAKLEY, RL ;
RUNYAN, WR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) :733-&
[2]   PREPARATION AND PROPERTIES OF AMORPHOUS SILICON NITRIDE FILMS [J].
CHU, TL ;
LEE, CH ;
GRUBER, GA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) :717-&
[3]  
Kubaschewski O., 1958, METALLURGICAL THERMO
[4]   EQUILIBRIUM BEHAVIOR OF SILICON-HYDROGEN-CHLORINE SYSTEM [J].
LEVER, RF .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) :460-&
[5]  
POPPER P, 1961, BRIT CERAM T, V60, P603
[7]  
1958, KAGAKUBINRAN