LIQUID JUNCTIONS FOR CHARACTERIZATION OF ELECTRONIC MATERIALS .2. PHOTOREFLECTANCE AND ELECTROREFLECTANCE OF N-SI

被引：19

作者：

SHEN, WM ^{[1
]}

FANTINI, MCA ^{[1
]}

TOMKIEWICZ, M ^{[1
]}

GAMBINO, JP ^{[1
]}

机构：

[1] IBM CORP, HOPEWELL JUNCTION, NY 12533 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 04期

关键词：

D O I：

10.1063/1.344492

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1759 / 1764

页数：6

共 17 条

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