HIGH-CURRENT ION-IMPLANTATION BY PLASMA IMMERSION TECHNIQUE

被引：7

作者：

THOMAE, RW ^{[1
]}

SEILER, B ^{[1
]}

BENDER, H ^{[1
]}

BRUTSCHER, J ^{[1
]}

GUNZEL, R ^{[1
]}

HALDER, J ^{[1
]}

KLEIN, H ^{[1
]}

MULLER, J ^{[1
]}

SARSTEDT, M ^{[1
]}

机构：

[1] ROSSENDORF INC,FORSCHUNGSZENTRUM ROSSENDORF EV,INST IONENSTRAHLPHYS & MAT FORSCH,D-01314 DRESDEN,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 99卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)00228-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Plasma immersion ion implantation (PIII) is a novel technique which is under investigation at several laboratories. In this paper we present a short review on existing experiments and work which is done at the Frankfurt PIII experiment.

引用

页码：569 / 572

页数：4

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