POST-HYDROGENATION OF CVD DEPOSITED A-SI FILMS

[1] SIMS ANALYSIS OF DEUTERIUM DIFFUSION IN HYDROGENATED AMORPHOUS SILICON [J]. APPLIED PHYSICS LETTERS, 1978, 33 (01) : 81 - 83

[2] DIEUMEGARD D, 1978, 4TH INT C ION BEAM A

[3] DOPING AND ANNEALING EFFECTS ON ESR IN CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICON [J]. SOLID STATE COMMUNICATIONS, 1979, 29 (01) : 13 - 16

[4] HIROSE M, 1978, 7TH P INT C LIQ AM S, P352

[5] HYDROGENATION OF EVAPORATED AMORPHOUS SILICON FILMS BY PLASMA TREATMENT [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 440 - 442

[6] HYDROGENATION AND DEHYDROGENATION OF AMORPHOUS AND CRYSTALLINE SILICON [J]. APPLIED PHYSICS LETTERS, 1978, 32 (07) : 439 - 441

[7] DOPED AMORPHOUS-SEMICONDUCTORS [J]. ADVANCES IN PHYSICS, 1977, 26 (06) : 811 - 845

[8] TANIGUCHI M, 1978, 4TH P INT C VAP GROW

[9] TANIGUCHI M, 1978, J CRYSTAL GROWTH, P45

[1] SIMS ANALYSIS OF DEUTERIUM DIFFUSION IN HYDROGENATED AMORPHOUS SILICON [J]. APPLIED PHYSICS LETTERS, 1978, 33 (01) : 81 - 83

[2] DIEUMEGARD D, 1978, 4TH INT C ION BEAM A

[3] DOPING AND ANNEALING EFFECTS ON ESR IN CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICON [J]. SOLID STATE COMMUNICATIONS, 1979, 29 (01) : 13 - 16

[4] HIROSE M, 1978, 7TH P INT C LIQ AM S, P352

[5] HYDROGENATION OF EVAPORATED AMORPHOUS SILICON FILMS BY PLASMA TREATMENT [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 440 - 442

[6] HYDROGENATION AND DEHYDROGENATION OF AMORPHOUS AND CRYSTALLINE SILICON [J]. APPLIED PHYSICS LETTERS, 1978, 32 (07) : 439 - 441

[7] DOPED AMORPHOUS-SEMICONDUCTORS [J]. ADVANCES IN PHYSICS, 1977, 26 (06) : 811 - 845

[8] TANIGUCHI M, 1978, 4TH P INT C VAP GROW

[9] TANIGUCHI M, 1978, J CRYSTAL GROWTH, P45