A NEW LPCVD TECHNIQUE OF PRODUCING BOROPHOSPHOSILICATE GLASS-FILMS BY INJECTION OF MISCIBLE LIQUID PRECURSORS

被引：31

作者：

LEVY, RA

GALLAGHER, PK

SCHREY, F

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 02期

关键词：

D O I：

10.1149/1.2100473

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：430 / 437

页数：8

共 16 条

[1] MEASURING THE PHOSPHORUS CONCENTRATION IN DEPOSITED PHOSPHOSILICATE FILMS [J].

ADAMS, AC ;

MURARKA, SP .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (02) :334-338

[2] PROCESS AND FILM CHARACTERIZATION OF LOW-PRESSURE TETRAETHYLORTHOSILICATE-BOROPHOSPHOSILICATE GLASS [J].

BECKER, FS ;

PAWLIK, D ;

SCHAFER, H ;

STAUDIGL, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (03) :732-744

[3] MICROPROBE TECHNIQUE FOR DETERMINATION OF THICKNESS AND PHOSPHORUS CONCENTRATION OF GATE OXIDE PHOSPHOSILICATE GLASS IN FET DEVICES [J].

DIGIACOMO, G .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (03) :419-422

[4] SIMULTANEOUS OR SEQUENTIAL DETERMINATION OF THE ELEMENTS AT ALL CONCENTRATION LEVELS - RENAISSANCE OF AN OLD APPROACH [J].

FASSEL, VA .

ANALYTICAL CHEMISTRY, 1979, 51 (13) :1290-&

[5]

GROVE AS, 1967, PHYS TECHNOL S, P102

[6]

KERN W, 1971, RCA REV, V32, P429

[7]

KERN W, 1982, RCA REV, V43, P423

[8]

KERN W, 1985, SOLID STATE TECHNOL, V28, P171

[9] EVALUATION OF THE PHOSPHORUS CONCENTRATION AND ITS EFFECT ON VISCOUS-FLOW AND REFLOW IN PHOSPHOSILICATE GLASS [J].

LEVY, RA ;

VINCENT, SM ;

MCGAHAN, TE .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (06) :1472-1480

[10]

LEVY RA, 1986, ELECTROCHEMICAL SOC, P132

← 1 2 →