BRIDGE AND VAN-DER-PAUW SHEET RESISTORS FOR CHARACTERIZING LINE-WIDTH OF CONDUCTING LAYERS

被引：99

作者：

BUEHLER, MG

GRANT, SD

THURBER, WR

机构：

[1] National Bureau of Standards, Electronic Technology Division, Washington

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 04期

关键词：

cross-bridge structure; diffused layer; line width; process control; sheet resistance;

D O I：

10.1149/1.2131517

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

It is shown that the line width of conducting layers can be computed from simple d-c electrical measurements made on bridge and van der Pauw shaped test structures. A compact six-contact, cross-bridge sheet resistor test structure was developed to make this measurement directly. Line widths measured on boron nitride diffused layers indicate that the method is sensitive to width variations of the order of ±0.1 μm (±4 μin.). © 1978, The Electrochemical Society, Inc. All rights reserved.

引用

页码：650 / 654

页数：5

共 10 条

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