TRANSIENT 210-NM ABSORPTION IN FUSED-SILICA INDUCED BY HIGH-POWER UV LASER IRRADIATION

被引:34
作者
LECLERC, N [1 ]
PFLEIDERER, C [1 ]
HITZLER, H [1 ]
WOLFRUM, J [1 ]
GREULICH, KO [1 ]
THOMAS, S [1 ]
FABIAN, H [1 ]
TAKKE, R [1 ]
ENGLISCH, W [1 ]
机构
[1] HERAEUS QUARZGLAS GMBH,W-6450 HANAU,GERMANY
关键词
D O I
10.1364/OL.16.000940
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Synthetic fused silica, exposed to high-power KrF excimer laser irradiation, shows the well-known induced absorption at 210 nm owing to E' center generation. Time-resolved absorption spectroscopy reveals that this induced absorption is transient in nature. The generation rate of E' centers depends strongly on the irradiation history, the OH content, and previous high-temperature processes. In order to explain the experimental observations, a nonabsorbing state of the E' center is postulated. The recovery of the induced optical absorption in high-OH fused silica is explained as a conversion from E' centers to these nonabsorbing centers.
引用
收藏
页码:940 / 942
页数:3
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