ON THE USE OF H+ AND AR+ IONS FOR HIGH SPATIAL-RESOLUTION DEPTH PROFILING

被引：5

作者：

VERHOEVEN, J ^{[1
]}

ZEIJLEMAKER, H ^{[1
]}

PUIK, EJ ^{[1
]}

VANDERWIEL, MJ ^{[1
]}

机构：

[1] FDN FUNDAMENTAL RES MATTER,ASSOC EURATOM,INST PLASMA PHYS RIJNHUIZEN,3439 MN NIEUWEGEIN,NETHERLANDS

来源：

VACUUM | 1990年 / 41卷 / 4-6期

关键词：

D O I：

10.1016/0042-207X(90)93948-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on the destructive sputtering of NiC multilayer coatings which have a periodicity of 2.7 nm, using H+ as well as Ar+ ions of 750 eV energy. The influence of ion bombardment on interface roughness, interface mixing and density has been investigated by monitoring this process in situ using a soft X-ray reflection system. Ion bombardment has been demonstrated to decrease the roughness of a sputtered surface while a considerable intermixing of the interface below the sputtered layer occurs. Changes in the film density have not been observed. © 1990.

引用

页码：1327 / 1329

页数：3

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