60-GHZ NOISE PERFORMANCE OF ION-IMPLANTED INXGA1-XAS MESFETS

被引:3
作者
LAU, CL
FENG, M
SCHELLENBERG, J
BRUSENBACK, P
LEPKOWSKI, T
HWANG, T
ITO, C
机构
[1] UNIV ILLINOIS, URBANA, IL 61801 USA
[2] SCHELLENBERG ASSOCIATES, HUNTINGTON BEACH, CA 92647 USA
关键词
D O I
10.1109/55.79561
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-noise ion-implanted In(x)Ga(1-x)As MESFET's with 0.25-mu-m T-gates have been developed at 60 GHz. The device noise figure was 2.8 dB with an associated gain of 5.6 dB at 60 GHz. A hybrid two-stage amplifier using these ion-implanted In(x)Ga(1-x)As MESFET's achieved a noise figure of 4.6 dB with an associated gain of 10.1 dB at GHz. When this amplifier was biased at 100% I(dss), it achieved 11.5-dB gain at 60 GHz. These results, achieved using low-cost ion-implantation techniques, are the best reported noise figures for ion-implanted MESFET's.
引用
收藏
页码:244 / 245
页数:2
相关论文
共 9 条
[1]  
DUH KHG, 1988 IEEE MTT S, P923
[2]   DOES THE 2-DIMENSIONAL ELECTRON-GAS EFFECT CONTRIBUTE TO HIGH-FREQUENCY AND HIGH-SPEED PERFORMANCE OF FIELD-EFFECT TRANSISTORS [J].
FENG, M ;
LAU, CL ;
EU, V ;
ITO, C .
APPLIED PHYSICS LETTERS, 1990, 57 (12) :1233-1235
[3]   ION-IMPLANTED IN0.1GA0.9 AS METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS ON GAAS (100) SUBSTRATES [J].
FENG, M ;
WANG, GW ;
LIAW, YP ;
KALISKI, RW ;
LAU, CL ;
ITO, C .
APPLIED PHYSICS LETTERS, 1989, 55 (06) :568-569
[4]   OPTIMAL NOISE-FIGURE OF MICROWAVE GAAS-MESFETS [J].
FUKUI, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (07) :1032-1037
[5]  
Lau C. L., 1990, 1990 IEEE MTT-S International Microwave Symposium Digest (Cat. No.90CH2848-0), P431, DOI 10.1109/MWSYM.1990.99612
[6]   HALF-MICROMETER GATE-LENGTH ION-IMPLANTED GAAS-MESFET WITH 0.8-DB NOISE-FIGURE AT 16 GHZ [J].
LAU, CL ;
FENG, M ;
LEPKOWSKI, TR ;
WANG, GW ;
CHANG, Y ;
ITO, C .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (09) :409-411
[7]  
STILLMAN GE, 1982, GAINASP ALLOY SEMICO
[8]   MILLIMETER-WAVE ION-IMPLANTED GRADED INXGA1-XAS MESFETS GROWN BY MOCVD [J].
WANG, GW ;
FENG, M ;
KALISKI, R ;
LIAW, YP ;
LAU, C ;
ITO, C .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (10) :449-451
[9]  
WINDHORN TH, 1982, ELECTRON DEVIC LETT, V3, P18, DOI 10.1109/EDL.1982.25459