OPTICAL-EMISSION DIAGNOSTICS OF C-60-CONTAINING LASER-ABLATED PLUMES FOR CARBON-FILM DEPOSITION

被引：24

作者：

DWIVEDI, RK ^{[1
]}

THAREJA, RK ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,CTR LASER TECHNOL,KANPUR 208016,UTTAR PRADESH,INDIA

来源：

PHYSICAL REVIEW B | 1995年 / 51卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.51.7160

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Optical-emission studies of laser-ablated carbon plasma used for deposition of carbon films is reported at irradiance in the range 2.4×1089. 0×1010 W/cm2 using 1.064-, 0.532-, and 0.355-m laser wavelengths in the presence of ambient gas. The presence of argon gas has a pronounced effect on the emission. The vibrational temperature calculated from molecular C2 Swan bands is found to peak at an intermediate laser irradiance. C60-containing carbon films are deposited on a silicon substrate at various ambient gas pressures and the correlation between their formation and laser-produced plasma parameters is discussed. © 1995 The American Physical Society.

引用

页码：7160 / 7167

页数：8

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