A MASS-SPECTROMETRIC INVESTIGATION OF THE PLASMA POLYMERIZATION OF METHYLTRIMETHOXYSILANE IN AN RF DISCHARGE

被引:12
作者
HAYS, AK
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10.1016/0040-6090(81)90178-4
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T [工业技术];
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08 ;
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页码:401 / 407
页数:7
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共 9 条
[1]   LOW-TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS [J].
ALT, LL ;
ING, SW ;
LAENDLE, KW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (05) :465-465
[2]   PLASMA-POLYMERIZED ORGANOSILANES AS PROTECTIVE COATINGS FOR SOLAR FRONT SURFACE MIRRORS [J].
BIEG, KW ;
WISCHMANN, KB .
SOLAR ENERGY MATERIALS, 1980, 3 (1-2) :301-316
[3]   GLOW DISCHARGE FORMATION OF SILICON OXIDE AND DEPOSITION OF SILICON OXIDE THIN FILM CAPACITORS BY GLOW DISCHARGE TECHNIQUES [J].
ING, SW ;
DAVERN, W .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (03) :284-&
[4]   CHEMICALLY MODIFIED TIN OXIDE ELECTRODE [J].
MOSES, PR ;
WIER, L ;
MURRAY, RW .
ANALYTICAL CHEMISTRY, 1975, 47 (12) :1882-1886
[5]   DEPOSITION OF THIN-FILMS BY DECOMPOSITION OF TETRA-ETHOXY SILANE IN A RADIO-FREQUENCY GLOW-DISCHARGE [J].
MUKHERJEE, SP ;
EVANS, PE .
THIN SOLID FILMS, 1972, 14 (01) :105-118
[6]  
Ritter E., 1962, J MOD OPTIC, V9, P197, DOI [10.1080/713826414, DOI 10.1080/713826414]
[7]   DEPOSITION OF SILICA FILMS BY GLOW DISCHARGE TECNIQUE [J].
SECRIST, DR ;
MACKENZIE, JD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (09) :914-+
[8]  
Vasile M. J., 1974, International Journal of Mass Spectrometry and Ion Physics, V13, P381, DOI 10.1016/0020-7381(74)83018-4
[9]  
YASUDA H, 1977, J APPL POLYM SCI, V21, P3179, DOI 10.1002/app.1977.070211128