4H-SIC/6H-SIC INTERFACE STRUCTURES STUDIED BY HIGH-RESOLUTION TRANSMISSION ELECTRON-MICROSCOPY

被引:5
作者
IWASAKI, H
INOUE, S
YOSHINOBU, T
TARUTANI, M
TAKAI, Y
SHIMIZU, R
ITO, A
KIMOTO, T
MATSUNAMI, H
机构
[1] OSAKA UNIV,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN
[2] KYOTO UNIV,DEPT ELECT ENGN,SAKYO KU,KYOTO 60601,JAPAN
关键词
D O I
10.1063/1.110405
中图分类号
O59 [应用物理学];
学科分类号
摘要
The interface structures of 4H-SiC/6H-SiC heterostructures formed in monocrystalline bulk silicon carbide were studied by high-resolution electron microscopy of cross-sectional specimens. The samples were grown on the (0001BAR) C face of a 6H-SiC seed with in situ Ce doping. The observed transition region is atomically flat over regions of several hundreds nm. The transition from the initial 6H-SiC growth to the 4H-SiC growth happens all at once at certain thicknesses with the occurrence of only a few layers of 4H-SiC (6H-SiC) before (after) the transition. The atomic stacking sequence at the interface of the two polytype crystals can be resolved.
引用
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页码:2636 / 2637
页数:2
相关论文
共 8 条
[1]   LIMITING THICKNESS HEPI FOR EPITAXIAL-GROWTH AND ROOM-TEMPERATURE SI GROWTH ON SI(100) [J].
EAGLESHAM, DJ ;
GOSSMANN, HJ ;
CERULLO, M .
PHYSICAL REVIEW LETTERS, 1990, 65 (10) :1227-1230
[2]  
Ito A., UNPUB
[4]   CONTROLLED SUBLIMATION GROWTH OF SINGLE CRYSTALLINE 4H-SIC AND 6H-SIC AND IDENTIFICATION OF POLYTYPES BY X-RAY-DIFFRACTION [J].
KANAYA, M ;
TAKAHASHI, J ;
FUJIWARA, Y ;
MORITANI, A .
APPLIED PHYSICS LETTERS, 1991, 58 (01) :56-58
[5]  
Koga K., 1985, 17TH C SOL STAT DEV, P249
[6]  
MATSUNAMI H, 1991, 1991 INT C SOL STAT, P138
[7]   INTERFACE STRUCTURES IN BETA-SILICON CARBIDE THIN-FILMS [J].
NUTT, SR ;
SMITH, DJ ;
KIM, HJ ;
DAVIS, RF .
APPLIED PHYSICS LETTERS, 1987, 50 (04) :203-205
[8]   THERMODYNAMICS OF SURFACE-MORPHOLOGY [J].
WILLIAMS, ED ;
BARTELT, NC .
SCIENCE, 1991, 251 (4992) :393-400