LOW-STRESS TANTALUM ABSORBERS DEPOSITED BY SPUTTERING FOR X-RAY MASKS

被引：22

作者：

IIMURA, Y

MIYASHITA, H

SANO, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584481

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1680 / 1683

页数：4

共 13 条

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[9]

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