TUNGSTEN - AN ALTERNATIVE TO GOLD FOR X-RAY MASKS

被引：26

作者：

KARNEZOS, M

RUBY, R

HEFLINGER, B

NAKANO, H

JONES, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583884

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：283 / 287

页数：5

共 14 条

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[4] GROSSMAN WM, IN PRESS J VAC SCI B
[5] HEFLINGER B, 1987, MICROELECTRONIC ENG
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WEIMAR, P
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 278 - 282
[7] EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS
KARNEZOS, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 226 - 229
[8] INFLUENCE OF ABSORBER STRESS ON THE PRECISION OF X-RAY MASKS
MULLER, KH
TISCHER, P
WINDBRACKE, W
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 230 - 234
[9] NEUKERMANS AP, 1983, P SOC PHOTO-OPT INST, V393, P93, DOI 10.1117/12.935099
[10] PROXIMITY EFFECT CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY BY EQUALIZATION OF BACKGROUND DOSE
OWEN, G
RISSMAN, P
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) : 3573 - 3581