EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS

[1] BEAMS JW, 1959, STRUCTURE PROPERTIES

[2] CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 534 - 535

[3] E-BEAM METROLOGY OF CHROMIUM MASTER MASKS AND OF MASKS FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 237 - 240

[4] GARRETTSON G, 1983, MICROCIRCUIT ENG 83, P247

[5] DETERMINATION OF STRESS IN FILMS ON SINGLE CRYSTALLINE SILICON SUBSTRATES [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1965, 36 (01) : 7 - +

[6] HEUBERGER A, 1984, INT ELECTRON DEVICES

[7] MORSE, 1953, METHODS THEORETICAL, P1452

[8] OVERLAY MEASUREMENTS FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 241 - 244

[9] RAYLEIGH, THEORY SOUND, V1

[10] YARWOOD TM, 1953, ACOUSTICS

[1] BEAMS JW, 1959, STRUCTURE PROPERTIES

[2] CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 534 - 535

[3] E-BEAM METROLOGY OF CHROMIUM MASTER MASKS AND OF MASKS FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 237 - 240

[4] GARRETTSON G, 1983, MICROCIRCUIT ENG 83, P247

[5] DETERMINATION OF STRESS IN FILMS ON SINGLE CRYSTALLINE SILICON SUBSTRATES [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1965, 36 (01) : 7 - +

[6] HEUBERGER A, 1984, INT ELECTRON DEVICES

[7] MORSE, 1953, METHODS THEORETICAL, P1452

[8] OVERLAY MEASUREMENTS FOR X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 241 - 244

[9] RAYLEIGH, THEORY SOUND, V1

[10] YARWOOD TM, 1953, ACOUSTICS