X-RAY MASK HEATING DURING ELECTRON-BEAM PATTERNING

被引：6

作者：

KARNEZOS, M

WEIMAR, P

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583882

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：278 / 282

页数：5

共 11 条

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[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (12) : 4726 - 4729
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[6] EFFECTS OF STRESS ON THE STABILITY OF X-RAY MASKS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 226 - 229
[7] INFLUENCE OF ABSORBER STRESS ON THE PRECISION OF X-RAY MASKS
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WINDBRACKE, W
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 230 - 234
[8] NEUKERMANS AP, 1981, HEWLETT-PACKARD J, V32, P24
[9] ELECTRON-BEAM RESIST EDGE PROFILE SIMULATION
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[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 686 - 693
[10] Patankar S., 1980, NUMERICAL HEAT TRANS, P60