OXIDATION OF SILICON

被引:130
作者
MOTT, NF
RIGO, S
ROCHET, F
STONEHAM, AM
机构
[1] UNIV PARIS 07, ECOLE NORM SUPER, PHYS SOLIDES GRP, F-75251 PARIS 05, FRANCE
[2] HARWELL LAB, DIV THEORET PHYS, DIDCOT OX11 0RA, OXON, ENGLAND
来源
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1989年 / 60卷 / 02期
关键词
D O I
10.1080/13642818908211190
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:189 / 212
页数:24
相关论文
共 106 条
[21]   PHENOMENOLOGICAL MODEL FOR SILICON OXIDATION IN DRY OXYGEN IN THE PRESENCE OF HCL [J].
ELLIS, AI ;
GARDINER, KM ;
CYR, TE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (09) :1970-1974
[22]   A REVISED ANALYSIS OF DRY OXIDATION OF SILICON [J].
FARGEIX, A ;
GHIBAUDO, G ;
KAMARINOS, G .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2878-2880
[23]  
FARGEIX A, 1984, J APPL PHYS, V56, pA58
[24]  
FARGEIX A, 1984, J APPL PHYS, V56, P7153
[25]  
FERRARI L, 1987, EPL-EUROPHYS LETT, V3, P617
[26]   EVIDENCE FOR A WIDE CONTINUUM OF POLYMORPHS IN ALPHA-SIO2 [J].
FIORI, C ;
DEVINE, RAB .
PHYSICAL REVIEW B, 1986, 33 (04) :2972-2974
[27]   X-RAY-SCATTERING STUDIES OF THE SI-SIO2 INTERFACE [J].
FUOSS, PH ;
NORTON, LJ ;
BRENNAN, S ;
FISCHERCOLBRIE, A .
PHYSICAL REVIEW LETTERS, 1988, 60 (07) :600-603
[28]   MODELING OF SILICON OXIDATION BASED ON STRESS-RELAXATION [J].
GHIBAUDO, G .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1987, 55 (02) :147-158
[29]  
GROVENOR CRM, 1989, IN PRESS J APPL PHYS
[30]  
GROVENOR CRM, 1986, MRS S, V53, P221