CRYSTAL DEFECTS OF SILICON FILMS FORMED BY MOLECULAR-BEAM EPITAXY

被引：30

作者：

SUGIURA, H

YAMAGUCHI, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1980年 / 19卷 / 04期

关键词：

D O I：

10.1143/JJAP.19.583

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：583 / 589

页数：7

共 26 条

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