FIELD-DEPENDENCE OF DIELECTRIC-CONSTANT DURING ANODIC-OXIDATION OF TANTALUM, NIOBIUM, AND TUNGSTEN

[1] DELLOCA CJ, 1970, J ELECTROCHEM SOC, V117, P1545, DOI [10.1149/1.2407379, 10.1149/1.2407380]

[2] ELECTRIC FIELD DEPENDENCE OF NET ACTIVATION ENERGY FOR MIGRATION OF IONIC SPECIES ACROSS AN ACTIVATION BARRIER [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (02) : 375 - &

[3] HIGH FIELD KINETIC PROCESSES IN ANODIC OXIDE FILMS ON ALUMINIUM .I. CURRENT TRANSIENTS FOR LINEARLY CHANGING ELECTRIC FIELD STRENGTH [J]. CANADIAN JOURNAL OF CHEMISTRY, 1968, 46 (04): : 535 - &

[4] CONDUCTION PROPERTIES OF VALVE METAL-OXIDE SYSTEMS .I. A NEW THEORY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (07) : 722 - &

[5] ELECTRIC-FIELD-INDUCED SHIFT OF INTERFERENCE PEAKS OF THIN TANTALUM OXIDE FILMS [J]. APPLIED PHYSICS LETTERS, 1968, 13 (09) : 328 - &

[6] The constancy of the dielectric constants at extremely high field strengths. [J]. ZEITSCHRIFT FUR PHYSIK, 1931, 71 (1-2): : 106 - 123

[7] MEASUREMENT OF ANODIC OXIDE FILM THICKNESS BY ELECTROREFLECTANCE INTERFEROMETRY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (02) : 280 - &

[8] Deviations from Ohm's law in soda lime glass [J]. JOURNAL OF CHEMICAL PHYSICS, 1941, 9 (08) : 579 - 584

[9] AN ELLIPSOMETER FOR FOLLOWING FILM GROWTH [J]. SURFACE SCIENCE, 1969, 16 : 155 - &

[10] A COMPUTER-OPERATED FOLLOWING ELLIPSOMETER [J]. APPLIED OPTICS, 1967, 6 (10): : 1673 - &

[1] DELLOCA CJ, 1970, J ELECTROCHEM SOC, V117, P1545, DOI [10.1149/1.2407379, 10.1149/1.2407380]

[2] ELECTRIC FIELD DEPENDENCE OF NET ACTIVATION ENERGY FOR MIGRATION OF IONIC SPECIES ACROSS AN ACTIVATION BARRIER [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (02) : 375 - &

[3] HIGH FIELD KINETIC PROCESSES IN ANODIC OXIDE FILMS ON ALUMINIUM .I. CURRENT TRANSIENTS FOR LINEARLY CHANGING ELECTRIC FIELD STRENGTH [J]. CANADIAN JOURNAL OF CHEMISTRY, 1968, 46 (04): : 535 - &

[4] CONDUCTION PROPERTIES OF VALVE METAL-OXIDE SYSTEMS .I. A NEW THEORY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (07) : 722 - &

[5] ELECTRIC-FIELD-INDUCED SHIFT OF INTERFERENCE PEAKS OF THIN TANTALUM OXIDE FILMS [J]. APPLIED PHYSICS LETTERS, 1968, 13 (09) : 328 - &

[6] The constancy of the dielectric constants at extremely high field strengths. [J]. ZEITSCHRIFT FUR PHYSIK, 1931, 71 (1-2): : 106 - 123

[7] MEASUREMENT OF ANODIC OXIDE FILM THICKNESS BY ELECTROREFLECTANCE INTERFEROMETRY [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (02) : 280 - &

[8] Deviations from Ohm's law in soda lime glass [J]. JOURNAL OF CHEMICAL PHYSICS, 1941, 9 (08) : 579 - 584

[9] AN ELLIPSOMETER FOR FOLLOWING FILM GROWTH [J]. SURFACE SCIENCE, 1969, 16 : 155 - &

[10] A COMPUTER-OPERATED FOLLOWING ELLIPSOMETER [J]. APPLIED OPTICS, 1967, 6 (10): : 1673 - &