SUPERLUMINESCENT DIODES WITH ANGLED FACET ETCHED BY CHEMICALLY ASSISTED ION-BEAM ETCHING

被引:18
作者
LIN, CF
机构
[1] School of Electrical Engineering, Cornell University, Ithaca
关键词
DIODES; LUMINESCENT DEVICES; SEMICONDUCTOR DEVICES AND MATERIALS;
D O I
10.1049/el:19910604
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A superluminescent diode with very low spectral modulation has been made with one cleaved facet and one angled facet etched by chemically assisted ion beam etching. Without antireflection coating, the reflection of light back into the waveguide from the etched angled facet is less than 1 x 10(-5). In addition, 85% of the total output power can be coupled from the etched angled facet without applying any anti-reflection or high-reflection coating on either facet.
引用
收藏
页码:968 / 970
页数:3
相关论文
共 6 条
[1]   HIGH-POWER SUPERLUMINESCENT DIODES [J].
ALPHONSE, GA ;
GILBERT, DB ;
HARVEY, MG ;
ETTENBERG, M .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1988, 24 (12) :2454-2457
[2]   FABRICATION AND CHARACTERISTICS OF ION-BEAM ETCHED CAVITY INP/INGAASP BH LASERS [J].
BOUADMA, N ;
HOGREL, JF ;
CHARIL, J ;
CARRE, M .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1987, 23 (06) :909-914
[3]   ACTIVE-MODE LOCKING OF INGAASP BREWSTER ANGLED SEMICONDUCTOR-LASERS [J].
CHANG, JTK ;
VUKUSIC, JI .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1987, 23 (08) :1329-1331
[4]   MEASUREMENT OF THE MODAL REFLECTIVITY OF AN ANTI-REFLECTION COATING ON A SUPERLUMINESCENT DIODE [J].
KAMINOW, IP ;
EISENSTEIN, G ;
STULZ, LW .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1983, 19 (04) :493-495
[5]   FABRICATION AND CHARACTERISTICS OF AN INTEGRATED DFB LASER-AMPLIFIER HAVING REACTIVE-ION-ETCHED TILTED END FACETS [J].
NAKANO, Y ;
HAYASHI, Y ;
CHEN, N ;
SAKAGUCHI, Y ;
TADA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (12) :L2430-L2433
[6]   ULTRA-LOW REFLECTIVITY 1.5-MU-M SEMICONDUCTOR-LASER PREAMPLIFIER [J].
OLSSON, NA ;
OBERG, MG ;
TZENG, LD ;
CELLA, T .
ELECTRONICS LETTERS, 1988, 24 (09) :569-570