LPE GROWTH OF HG0.60CD0.40TE FROM TE-RICH SOLUTION

被引:51
作者
SCHMIT, JL
BOWERS, JE
机构
[1] Honeywell Corporate Technology Center, Bloomington
关键词
D O I
10.1063/1.91159
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hg0.60Cd0.40Te has been grown at atmospheric pressure using a liquid phase epitaxy (LPE) slider system. The compositions are uniform to within ±0.01 mole fraction across the layer and with depth into the layer except for a 3-μm-thick interdiffusion region. The layers are p type as grown with carrier concentration of 1017 cm-3 and are annealable to n type with a carrier concentration of 4×1015 cm-3.
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页码:457 / 458
页数:2
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