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STRUCTURE AND PROPERTIES OF CVD-BN THICK-FILM PREPARED ON CARBON-STEEL SUBSTRATE
被引:35
作者
:
TAKAHASHI, T
论文数:
0
引用数:
0
h-index:
0
TAKAHASHI, T
ITOH, H
论文数:
0
引用数:
0
h-index:
0
ITOH, H
KURODA, M
论文数:
0
引用数:
0
h-index:
0
KURODA, M
机构
:
来源
:
JOURNAL OF CRYSTAL GROWTH
|
1981年
/ 53卷
/ 02期
关键词
:
D O I
:
10.1016/0022-0248(81)90092-0
中图分类号
:
O7 [晶体学];
学科分类号
:
0702 ;
070205 ;
0703 ;
080501 ;
摘要
:
引用
收藏
页码:418 / 422
页数:5
相关论文
共 9 条
[1]
GEBHARDT JJ, 1973, 4TH INT C CHEM VAP D, P460
[2]
CVD-BN FOR BORON-DIFFUSION IN SI AND ITS APPLICATION TO SI DEVICES
HIRAYAMA, M
论文数:
0
引用数:
0
h-index:
0
机构:
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
HIRAYAMA, M
SHOHNO, K
论文数:
0
引用数:
0
h-index:
0
机构:
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SHOHNO, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(12)
: 1671
-
1676
[3]
STRUCTURE AND PROPERTIES OF BORON-NITRIDE FILMS GROWN BY HIGH-TEMPERATURE REACTIVE PLASMA DEPOSITION
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
HYDER, SB
YEP, TO
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
YEP, TO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(11)
: 1721
-
1724
[4]
EFFECT OF GROWTH-PARAMETERS ON THE CVD OF BORON-NITRIDE AND PHOSPHORUS-DOPED BORON-NITRIDE
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
CHANG, CC
WANG, DNK
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
WANG, DNK
SMITH, TE
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SMITH, TE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(11)
: 1951
-
1957
[5]
POWELL CF, 1962, VAPOUR DEPOSITION, P663
[6]
PREPARATION AND PROPERTIES OF THIN FILM BORON NITRIDE
RAND, MJ
论文数:
0
引用数:
0
h-index:
0
RAND, MJ
ROBERTS, JF
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JF
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 423
-
&
[7]
CHEMICAL VAPOR-DEPOSITION OF HEXAGONAL BORON-NITRIDE THICK-FILM ON IRON
TAKAHASHI, T
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKAHASHI, T
ITOH, H
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
ITOH, H
TAKEUCHI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKEUCHI, A
[J].
JOURNAL OF CRYSTAL GROWTH,
1979,
47
(02)
: 245
-
250
[8]
Takahashi T., 1981, Yogyo-Kyokai-Shi, V89, P63, DOI 10.2109/jcersj1950.89.1026_63
[9]
WALKER P, 1968, CHEM PHYSICS CARBON, V4, P60
←
1
→
共 9 条
[1]
GEBHARDT JJ, 1973, 4TH INT C CHEM VAP D, P460
[2]
CVD-BN FOR BORON-DIFFUSION IN SI AND ITS APPLICATION TO SI DEVICES
HIRAYAMA, M
论文数:
0
引用数:
0
h-index:
0
机构:
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
HIRAYAMA, M
SHOHNO, K
论文数:
0
引用数:
0
h-index:
0
机构:
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SOPHIA UNIV,DEPT ELECTR,CHIYODA 102,TOKYO,JAPAN
SHOHNO, K
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(12)
: 1671
-
1676
[3]
STRUCTURE AND PROPERTIES OF BORON-NITRIDE FILMS GROWN BY HIGH-TEMPERATURE REACTIVE PLASMA DEPOSITION
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
HYDER, SB
YEP, TO
论文数:
0
引用数:
0
h-index:
0
机构:
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
VARIAN ASSOC,CORP SOLID STATE LAB,PALO ALTO,CA 94303
YEP, TO
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(11)
: 1721
-
1724
[4]
EFFECT OF GROWTH-PARAMETERS ON THE CVD OF BORON-NITRIDE AND PHOSPHORUS-DOPED BORON-NITRIDE
MURARKA, SP
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
MURARKA, SP
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
CHANG, CC
WANG, DNK
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
WANG, DNK
SMITH, TE
论文数:
0
引用数:
0
h-index:
0
机构:
Bell Laboratories, Murray Hill
SMITH, TE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(11)
: 1951
-
1957
[5]
POWELL CF, 1962, VAPOUR DEPOSITION, P663
[6]
PREPARATION AND PROPERTIES OF THIN FILM BORON NITRIDE
RAND, MJ
论文数:
0
引用数:
0
h-index:
0
RAND, MJ
ROBERTS, JF
论文数:
0
引用数:
0
h-index:
0
ROBERTS, JF
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(04)
: 423
-
&
[7]
CHEMICAL VAPOR-DEPOSITION OF HEXAGONAL BORON-NITRIDE THICK-FILM ON IRON
TAKAHASHI, T
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKAHASHI, T
ITOH, H
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
ITOH, H
TAKEUCHI, A
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Faculty of Engineering, Nagoya University, Nagoya
TAKEUCHI, A
[J].
JOURNAL OF CRYSTAL GROWTH,
1979,
47
(02)
: 245
-
250
[8]
Takahashi T., 1981, Yogyo-Kyokai-Shi, V89, P63, DOI 10.2109/jcersj1950.89.1026_63
[9]
WALKER P, 1968, CHEM PHYSICS CARBON, V4, P60
←
1
→