OXIDATION-KINETICS OF SI(111) 7X7 IN THE SUBMONOLAYER REGIME

被引：117

作者：

GUPTA, P

MAK, CH

COON, PA

GEORGE, SM

机构：

来源：

PHYSICAL REVIEW B | 1989年 / 40卷 / 11期

关键词：

D O I：

10.1103/PhysRevB.40.7739

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7739 / 7749

页数：11

共 59 条

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