AMBIENT-INDUCED DEFECT STATES AT A-SI-H/ITO INTERFACES

被引:6
作者
HOHEISEL, M
BRUTSCHER, N
WIECZOREK, H
机构
关键词
D O I
10.1016/0022-3093(89)90378-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:114 / 116
页数:3
相关论文
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