BASIC MECHANISMS IN PLASMA-ETCHING

被引：35

作者：

DEUTSCH, H

KERSTEN, H

RUTSCHER, A

机构：

来源：

CONTRIBUTIONS TO PLASMA PHYSICS | 1989年 / 29卷 / 03期

关键词：

D O I：

10.1002/ctpp.2150290304

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：263 / 284

页数：22

共 41 条

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