AR+ LASER-INDUCED CHEMICAL ETCHING OF MOLYBDENUM IN CHLORINE ATMOSPHERE

被引:9
作者
MOGYOROSI, P
PIGLMAYER, K
BAUERLE, D
机构
关键词
D O I
10.1016/0039-6028(89)90047-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
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页码:232 / 244
页数:13
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共 16 条
[1]  
BAUERLE D, 1986, SPRINGER SERIES MATE, V1
[2]  
BRESLER PI, 1971, J PRIKL SPECTR, V14, P728
[3]   LASER-INDUCED GAS-SURFACE INTERACTIONS [J].
Chuang, T. J. .
SURFACE SCIENCE REPORTS, 1983, 3 (01) :1-105
[4]  
HUBMER GF, COMMUNICATION
[5]   HIGHLY DAMAGE-RESISTANT MO MIRROR FOR HIGH-POWER TEA CO2-LASER SYSTEMS [J].
ICHIKAWA, Y ;
YOSHIDA, K ;
TSUNAWAKI, Y ;
YAMANAKA, M ;
YAMANAKA, T ;
YAMANAKA, C ;
OKAMOTO, H ;
MATSUSUE, N ;
KITAJIMA, K .
APPLIED OPTICS, 1987, 26 (17) :3671-3675
[6]  
KULLMER R, 1988, IN PRESS APPL PHYS A, V47
[7]   CHLORINATION KINETICS OF TUNGSTEN, MOLYBDENUM, AND THEIR ALLOYS [J].
LANDSBERG, A ;
HOATSON, CL ;
BLOCK, FE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (08) :1331-+
[8]   FOCUS-POSITION SENSING USING LASER SPECKLE [J].
MCLAUGHLIN, JL .
APPLIED OPTICS, 1979, 18 (07) :1042-1045
[9]   LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .2. CONTINUOUS IRRADIATION [J].
MOGYOROSI, P ;
PIGLMAYER, K ;
KULLMER, R ;
BAUERLE, D .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04) :293-299
[10]   KINETICS OF ATTACK OF MOLYBDENUM BY DISSOCIATED CHLORINE [J].
ROSNER, DE ;
ALLENDOR.HD .
JOURNAL OF PHYSICAL CHEMISTRY, 1965, 69 (12) :4290-&