COMPUTER-GENERATED HOLOGRAMS FABRICATED BY DIRECT WRITE OF POSITIVE ELECTRON-BEAM RESIST

被引：23

作者：

URQUHART, KS

STEIN, R

LEE, SH

机构：

[1] Department of Electrical and Computer Engineering, University of California, San Diego, La Jolla, CA

来源：

OPTICS LETTERS | 1993年 / 18卷 / 04期

关键词：

D O I：

10.1364/OL.18.000308

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An e-beam lithographic technique is described that produces multiple discrete phase levels as a surface-relief structure directly in positive e-beam resist. Processing techniques are presented for two positive e-beam resists: EBR-9 and polymethyl methacrylate (PMMA). This fabrication technology is experimentally applied to produce sawtooth (blazed) gratings and multiphase-level numeric-type computer-generated holograms (i.e., kinoforms).

引用

页码：308 / 310

页数：3

共 9 条

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