CONTROLLED PREPARATION OF ALLOYS BY SIMULTANEOUS, MULTITARGET SPUTTERING

被引：12

作者：

SEGATTO, PR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.1492695

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：368 / &

共 10 条

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[4]

MAISSEL LI, 1963, VACUUM, V13, P421

[5]

MICHALAK EM, 1967, J VAC SCI TECHNOL, V17, P317

[6] CO-SPUTTERED AU-SIO2 CERMET FILMS [J].

MILLER, NC ;

SHIRN, GA .

[7]

PATTERSON WL, 1967, 2 S DEP THIN FILMS S, P97

[8]

SINCLAIR WR, 1962, REV SCI INSTR, V7, P744

[9] ROLE OF HYDROGEN IN SPUTTERING OF NICKEL-CHROMIUM FILMS [J].

STERN, E ;

CASWELL, HL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (03) :128-&

[10]

WEHNER GK, 1962, 2309 GEN MILLS REP