SILICON DIMETHYLAMIDO COMPLEXES AND AMMONIA AS PRECURSORS FOR THE ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE THIN-FILMS

被引：32

作者：

GORDON, RG

HOFFMAN, DM

RIAZ, U

机构：

来源：

关键词：

D O I：

10.1021/cm00011a002

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：480 / 482

页数：3

共 20 条

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