THEORETICAL-STUDY OF AL OVERLAYERS ON SI(111)

被引：20

作者：

ZHANG, HI

SCHLUTER, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 04期

关键词：

D O I：

10.1116/1.569793

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1384 / 1388

页数：5

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