REDUCTION OF INTERFACE PHONON MODES USING METAL-SEMICONDUCTOR HETEROSTRUCTURES

被引:25
作者
BHATT, AR
KIM, KW
STROSCIO, MA
LAFRATE, GJ
DUTTA, M
GRUBIN, HL
HAQUE, R
ZHU, XT
机构
[1] USA, RES OFF, RES TRIANGLE PK, NC 27709 USA
[2] USA, RES LAB, ELECTR & POWER SOURCES DIRECTORATE, FT MONMOUTH, NJ 07703 USA
[3] SCI RES ASSOCIATES INC, GLASTONBURY, CT 06033 USA
[4] DUKE UNIV, DEPT PHYS, DURHAM, NC 27706 USA
[5] MOTOROLA INC, PHOENIX CORP RES LABS, TEMPE, AZ 85284 USA
关键词
D O I
10.1063/1.353139
中图分类号
O59 [应用物理学];
学科分类号
摘要
Based on a simplified analysis of perfectly conducting metals, it has been suggested qualitatively that establishing metal-semiconductor interfaces at the heterojunctions of polar semiconductor quantum wells introduces a set of boundary conditions that dramatically reduces or eliminates unwanted carrier energy loss caused by interactions with interface longitudinal-optical (LO) phonon modes. In this article, it is theoretically demonstrated that comparable reductions in LO phonon scattering strengths may be achieved for metal-semiconductor structures with metal having realistic conductivities and Thomas-Fermi screening lengths.
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页码:2338 / 2342
页数:5
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