学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
GA1-YINYAS/INASXP1-X (Y-GREATER-THAN-0.53, X-GREATER-THAN-0) PIN PHOTODIODES FOR LONG WAVELENGTH REGIONS (LAMBDA-GREATER-THAN-2-MU-M) GROWN BY HYDRIDE VAPOR-PHASE EPITAXY
被引:19
作者
:
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
MAKITA, K
[
1
]
TORIKAI, T
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
TORIKAI, T
[
1
]
ISHIHARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
ISHIHARA, H
[
1
]
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
TAGUCHI, K
[
1
]
机构
:
[1]
NEC CORP,DIV COMPOUND SEMICOND DEVICE,NAKAHARA KU,KAWASAKI 211,JAPAN
来源
:
ELECTRONICS LETTERS
|
1988年
/ 24卷
/ 07期
关键词
:
D O I
:
10.1049/el:19880256
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:379 / 380
页数:2
相关论文
共 7 条
[1]
ALBRECHT H, 1983, JPN J APPL PHYS, V22, pL364
[2]
HIGH-TEMPERATURE AGING TESTS ON PLANAR STRUCTURE INGAAS INP PIN PHOTODIODES WITH TI/PT AND TI/AU CONTACT
ISHIHARA, H
论文数:
0
引用数:
0
h-index:
0
ISHIHARA, H
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
MAKITA, K
SUGIMOTO, Y
论文数:
0
引用数:
0
h-index:
0
SUGIMOTO, Y
TORIKAI, T
论文数:
0
引用数:
0
h-index:
0
TORIKAI, T
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
TAGUCHI, K
[J].
ELECTRONICS LETTERS,
1984,
20
(16)
: 654
-
656
[3]
OXYGEN ADDITION PURIFICATION EFFECT IN INGAAS GROWTH BY HYDRIDE VPE
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MAKITA, K
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TAGUCHI, K
USUI, A
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
USUI, A
[J].
JOURNAL OF CRYSTAL GROWTH,
1984,
69
(2-3)
: 613
-
615
[4]
MIZUTANI T, 1983, JPN J APPL PHYS, V22, pL364
[5]
INTERFACIAL LATTICE MISMATCH EFFECTS IN III-V COMPOUNDS
OLSEN, GH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
OLSEN, GH
[J].
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
: 223
-
239
[6]
VAPOR-PHASE EPITAXIAL-GROWTH OF INGAAS-INASP HETEROJUNCTIONS FOR LONG WAVELENGTH TRANSFERRED ELECTRON PHOTO-CATHODES
SAXENA, RR
论文数:
0
引用数:
0
h-index:
0
SAXENA, RR
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
HYDER, SB
GREGORY, PE
论文数:
0
引用数:
0
h-index:
0
GREGORY, PE
ESCHER, JS
论文数:
0
引用数:
0
h-index:
0
ESCHER, JS
[J].
JOURNAL OF CRYSTAL GROWTH,
1980,
50
(02)
: 481
-
484
[7]
HIGH-SPEED PLANAR-STRUCTURE INP INGAASP INGAAS AVALANCHE PHOTODIODE GROWN BY VPE
SUGIMOTO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
SUGIMOTO, Y
TORIKAI, T
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TORIKAI, T
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MAKITA, K
ISHIHARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
ISHIHARA, H
MINEMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MINEMURA, K
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TAGUCHI, K
IWAKAMI, T
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
IWAKAMI, T
[J].
ELECTRONICS LETTERS,
1984,
20
(16)
: 653
-
654
←
1
→
共 7 条
[1]
ALBRECHT H, 1983, JPN J APPL PHYS, V22, pL364
[2]
HIGH-TEMPERATURE AGING TESTS ON PLANAR STRUCTURE INGAAS INP PIN PHOTODIODES WITH TI/PT AND TI/AU CONTACT
ISHIHARA, H
论文数:
0
引用数:
0
h-index:
0
ISHIHARA, H
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
MAKITA, K
SUGIMOTO, Y
论文数:
0
引用数:
0
h-index:
0
SUGIMOTO, Y
TORIKAI, T
论文数:
0
引用数:
0
h-index:
0
TORIKAI, T
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
TAGUCHI, K
[J].
ELECTRONICS LETTERS,
1984,
20
(16)
: 654
-
656
[3]
OXYGEN ADDITION PURIFICATION EFFECT IN INGAAS GROWTH BY HYDRIDE VPE
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MAKITA, K
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TAGUCHI, K
USUI, A
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,FUNDAMENTAL RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
USUI, A
[J].
JOURNAL OF CRYSTAL GROWTH,
1984,
69
(2-3)
: 613
-
615
[4]
MIZUTANI T, 1983, JPN J APPL PHYS, V22, pL364
[5]
INTERFACIAL LATTICE MISMATCH EFFECTS IN III-V COMPOUNDS
OLSEN, GH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS,PRINCETON,NJ 08540
RCA LABS,PRINCETON,NJ 08540
OLSEN, GH
[J].
JOURNAL OF CRYSTAL GROWTH,
1975,
31
(DEC)
: 223
-
239
[6]
VAPOR-PHASE EPITAXIAL-GROWTH OF INGAAS-INASP HETEROJUNCTIONS FOR LONG WAVELENGTH TRANSFERRED ELECTRON PHOTO-CATHODES
SAXENA, RR
论文数:
0
引用数:
0
h-index:
0
SAXENA, RR
HYDER, SB
论文数:
0
引用数:
0
h-index:
0
HYDER, SB
GREGORY, PE
论文数:
0
引用数:
0
h-index:
0
GREGORY, PE
ESCHER, JS
论文数:
0
引用数:
0
h-index:
0
ESCHER, JS
[J].
JOURNAL OF CRYSTAL GROWTH,
1980,
50
(02)
: 481
-
484
[7]
HIGH-SPEED PLANAR-STRUCTURE INP INGAASP INGAAS AVALANCHE PHOTODIODE GROWN BY VPE
SUGIMOTO, Y
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
SUGIMOTO, Y
TORIKAI, T
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TORIKAI, T
MAKITA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MAKITA, K
ISHIHARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
ISHIHARA, H
MINEMURA, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
MINEMURA, K
TAGUCHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
TAGUCHI, K
IWAKAMI, T
论文数:
0
引用数:
0
h-index:
0
机构:
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
NEC CORP,C&C SYST RES LABS,MIYAMAE KU,KAWASAKI 213,JAPAN
IWAKAMI, T
[J].
ELECTRONICS LETTERS,
1984,
20
(16)
: 653
-
654
←
1
→