FABRICATION OF MSM PHOTOCONDUCTOR ON POROUS SI USING MICROMACHINED SILICON MASK

An MSM photoconductive detector has been fabricated from porous silicon using a micromachined silicon mask of photolithography. This approach allows damage to porous silicon that can be caused by chemical processing to be avoided. The interdigitated pattern of the silicon mask with a finger spacing of approximately 150-mu-m and finger width of 50-mu-m was made using silicon micromachining, The fabricated MSM porous silicon photoconductive detector, which exhibits responsivities of better than 0.5A/W at the wavelength of the He-Ne laser (6280 angstrom) and a dark current of 950nA at 10V, is very promising as an optoelectronic device.