MOBILITY OF ELECTRONS IN A QUANTIZED SILICON INVERSION LAYER DUE TO PHONON-SCATTERING

被引:14
作者
ROYCHOUDHURY, D
BASU, PK
机构
来源
PHYSICAL REVIEW B | 1980年 / 22卷 / 12期
关键词
D O I
10.1103/PhysRevB.22.6325
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:6325 / 6329
页数:5
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