TANTALUM SILICIDE FILMS DEPOSITED BY DC SPUTTERING

[31] VOSSEN JL, 1968, RCA REV, V29, P566

[32] VOSSEN JL, 1978, THIN FILM PROCESSES, P60

[33] WESTWOOD W, 1975, TANTALUM THIN FILMS, P70

[34] PREPARATION OF MOLYBDENUM SILICIDE FILMS BY REACTIVE SPUTTERING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (05) : 1120 - 1124

[35] OXIDATION MECHANISMS IN WSI2 THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1978, 33 (01) : 76 - 78

[36] 853 STAND DIFFR POWD

[31] VOSSEN JL, 1968, RCA REV, V29, P566

[32] VOSSEN JL, 1978, THIN FILM PROCESSES, P60

[33] WESTWOOD W, 1975, TANTALUM THIN FILMS, P70

[34] PREPARATION OF MOLYBDENUM SILICIDE FILMS BY REACTIVE SPUTTERING [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (05) : 1120 - 1124

[35] OXIDATION MECHANISMS IN WSI2 THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1978, 33 (01) : 76 - 78

[36] 853 STAND DIFFR POWD