TANTALUM SILICIDE FILMS DEPOSITED BY DC SPUTTERING

[21] MURARKA SP, 1979, P INT ELECTRON DEVIC, P454

[22] PETERSSON CS, 1980, THIN FILM INTERFACES

[23] REACTION OF THIN METAL-FILMS WITH SIO2 SUBSTRATES [J]. SOLID-STATE ELECTRONICS, 1978, 21 (04) : 667 - &

[24] METAL-NITRIDE-OXIDE-SILICON FIELD-EFFECT TRANSISTORS WITH SELF-ALIGNED GATES [J]. SOLID-STATE ELECTRONICS, 1968, 11 (07) : 653 - +

[25] SCHWARZKOPF P, 1953, REFRACTORY HARD META, P333

[26] SEGMULLER A, UNPUBLISHED

[27] ROLE OF HYDROGEN IN SPUTTERING OF NICKEL-CHROMIUM FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (03): : 128 - &

[28] TSAI MY, UNPUBLISHED

[29] TU KN, 1978, THIN FILMS INTERDIFF, P305

[30] van Der Pauw L. J., 1958, PHILIPS RES REP, V13, P1

[21] MURARKA SP, 1979, P INT ELECTRON DEVIC, P454

[22] PETERSSON CS, 1980, THIN FILM INTERFACES

[23] REACTION OF THIN METAL-FILMS WITH SIO2 SUBSTRATES [J]. SOLID-STATE ELECTRONICS, 1978, 21 (04) : 667 - &

[24] METAL-NITRIDE-OXIDE-SILICON FIELD-EFFECT TRANSISTORS WITH SELF-ALIGNED GATES [J]. SOLID-STATE ELECTRONICS, 1968, 11 (07) : 653 - +

[25] SCHWARZKOPF P, 1953, REFRACTORY HARD META, P333

[26] SEGMULLER A, UNPUBLISHED

[27] ROLE OF HYDROGEN IN SPUTTERING OF NICKEL-CHROMIUM FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (03): : 128 - &

[28] TSAI MY, UNPUBLISHED

[29] TU KN, 1978, THIN FILMS INTERDIFF, P305

[30] van Der Pauw L. J., 1958, PHILIPS RES REP, V13, P1