REACTION OF THIN METAL-FILMS WITH SIO2 SUBSTRATES

被引：284

作者：

PRETORIUS, R ^{[1
]}

HARRIS, JM ^{[1
]}

NICOLET, MA ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

关键词：

D O I：

10.1016/0038-1101(78)90335-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：667 / &

共 14 条

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[7] Krautle H., 1974, APPL ION BEAMS METAL, P193
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