COMPARISON OF EROSION OF VITREOUS CARBON AND HIGH-DENSITY GRAPHITE IN MOLTEN SILICON

被引：3

作者：

CHANEY, RE ^{[1
]}

机构：

[1] MOTOROLA INC,SEMICOND GRP,PHOENIX,AZ 85008

来源：

关键词：

D O I：

10.1149/1.2133677

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1460 / 1461

页数：2

共 7 条

[1] EROSION OF MATERIALS IN MOLTEN SILICON [J].

CHANEY, RE ;

VARKER, CJ .

[2] DISSOLUTION OF FUSED SILICA IN MOLTEN SILICON [J].

CHANEY, RE ;

VARKER, CJ .

[3]

KIM KM, 1976, ERDAJPL954465

[4]

LAUDISE RA, 1970, GROWTH SINGLE CRYSTA, P187

[5]

MORRISON AD, 1976, ERDAJPL954355

[6]

SCHWUTTKE GH, 1976, ERDAJPL954144

[7] EFG PROCESS APPLIED TO GROWTH OF SILICON RIBBONS [J].

SWARTZ, JC ;

SUREK, T ;

CHALMERS, B .