ELECTRICAL MEASUREMENT OF THE DOPANT SEGREGATION PROFILE AT THE GRAIN-BOUNDARY IN SILICON BICRYSTALS

被引:5
作者
BRONIATOWSKI, A
机构
关键词
D O I
10.1063/1.341279
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:4516 / 4525
页数:10
相关论文
共 18 条
[1]  
AUCOUTURIER M, COMMUNICATION
[2]   MEASUREMENT OF THE GRAIN-BOUNDARY STATES IN SEMICONDUCTORS BY DEEP-LEVEL TRANSIENT SPECTROSCOPY [J].
BRONIATOWSKI, A .
PHYSICAL REVIEW B, 1987, 36 (11) :5895-5905
[3]   CHARGED GRAIN-BOUNDARIES IN GERMANIUM [J].
BRONIATOWSKI, A .
JOURNAL DE PHYSIQUE, 1981, 42 (05) :741-749
[4]   ELECTRONIC-PROPERTIES OF GRAIN-BOUNDARIES IN SEMICONDUCTORS [J].
BRONIATOWSKI, A .
REVUE DE PHYSIQUE APPLIQUEE, 1987, 22 (07) :585-590
[5]   GRAIN-BOUNDARY SEGREGATION IN SILICON HEAVILY DOPED WITH PHOSPHORUS AND ARSENIC [J].
CARABELAS, A ;
NOBILI, D ;
SOLMI, S .
JOURNAL DE PHYSIQUE, 1982, 43 (NC1) :187-192
[6]  
GROVENOR CRM, 1984, PHILOS MAG A, V50, P409, DOI 10.1080/01418618408244236
[7]   GRAIN-BOUNDARIES IN SEMICONDUCTORS [J].
GROVENOR, CRM .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1985, 18 (21) :4079-4119
[8]   CHEMICAL, COMPOSITIONAL, AND ELECTRICAL-PROPERTIES OF SEMICONDUCTOR GRAIN-BOUNDARIES [J].
KAZMERSKI, LL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :423-429
[9]   ON MEASUREMENT OF IMPURITY ATOM DISTRIBUTIONS IN SILICON BY DIFFERENTIAL CAPACITANCE TECHNIQUE [J].
KENNEDY, DP ;
MURLEY, PC ;
KLEINFELDER, W .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (05) :399-+
[10]  
MAURICE JL, UNPUB