CRYSTALLIZATION IN FLUORINATED AND HYDROGENATED AMORPHOUS-SILICON THIN-FILMS

被引:22
作者
EDELMAN, F
CYTERMANN, C
BRENER, R
EIZENBERG, M
KHAIT, YL
WEIL, R
BEYER, W
机构
[1] TECHNION ISRAEL INST TECHNOL,INST SOLID STATE,IL-32000 HAIFA,ISRAEL
[2] TECHNION ISRAEL INST TECHNOL,DEPT PHYS,IL-32000 HAIFA,ISRAEL
[3] FORSCHUNGSZENTRUM,INST SCHICHT & IONENTECH,W-5170 JULICH,GERMANY
关键词
D O I
10.1063/1.356572
中图分类号
O59 [应用物理学];
学科分类号
摘要
The amorphous-to-crystalline (AC) transition of amorphous Si thin films containing fluorine or hydrogen is studied by transmission electron microscopy. The AC transition can be described quantitatively by the incubation time prior to the onset of crystallization t0. This parameter is found to decrease exponentially with temperature with an activation energy of 1.7 eV for a-Si:F and 3.1 eV for a-Si:H:D. It is found that during the crystallization process in a-Si:F the crystallites organize as dendrite single crystals oriented along the [110] axis perpendicularly to the film surface. a-Si samples that had been covered by Pd or Al crystallize at appreciably lower temperatures. In the case of Al lower activation energies of 0.7 eV for hydrogenated and 0.4 eV for fluorinated a-Si are measured. In the case of Pd/a - Si:H,F for both kinds of a-Si an activation energy of 1.7 eV is found.
引用
收藏
页码:7875 / 7880
页数:6
相关论文
共 37 条
  • [1] PREPARATION AND PROPERTIES OF SPUTTERED A-SI-H-F FILMS
    BEYER, W
    CHEVALLIER, J
    REICHELT, K
    [J]. SOLAR ENERGY MATERIALS, 1983, 9 (02): : 229 - 245
  • [2] BEYER W, 1985, TETRAHEDRALLY BONDED, P129
  • [3] Blum N. A., 1972, Journal of Non-Crystalline Solids, V11, P242, DOI 10.1016/0022-3093(72)90006-3
  • [4] SILICIDE PRECIPITATION AND SILICON CRYSTALLIZATION IN NICKEL IMPLANTED AMORPHOUS-SILICON THIN-FILMS
    CAMMARATA, RC
    THOMPSON, CV
    HAYZELDEN, C
    TU, KN
    [J]. JOURNAL OF MATERIALS RESEARCH, 1990, 5 (10) : 2133 - 2138
  • [5] REORDERING OF AMORPHOUS LAYERS OF SI IMPLANTED WITH P-31, AS-75, AND B-11 IONS
    CSEPREGI, L
    KENNEDY, EF
    GALLAGHER, TJ
    MAYER, JW
    SIGMON, TW
    [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (10) : 4234 - 4240
  • [6] COMPARISON OF LOW-TEMPERATURE POLYSILICON CRYSTAL-GROWTH ON LOW-COST SUBSTRATES
    CZUBATYJ, W
    BEGLAU, D
    CHAO, BS
    GONZALEZHERNANDEZ, J
    PAWLIK, DA
    KLERSY, P
    JABLONSKI, D
    HIMMLER, R
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (02): : 294 - 298
  • [7] STRUCTURE OF ANNEALED POLYCRYSTALLINE SILICON FILMS .1. RECRYSTALLIZATION
    EDELMAN, FL
    HEYDENREICH, J
    HOEHL, D
    MATTHAI, J
    MELNIK, I
    RZHANOV, A
    VOELSKOV, M
    WERNER, P
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1986, 98 (02): : 383 - 390
  • [8] INITIAL SOLID-STATE REACTIONS BETWEEN CRYSTALLINE SB AND AMORPHOUS SI THIN-FILMS
    GONG, SF
    HENTZELL, HTG
    ROBERTSSON, AE
    [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) : 1457 - 1463
  • [9] THERMODYNAMIC INVESTIGATIONS OF SOLID-STATE SI-METAL INTERACTIONS .1. EXPERIMENTAL AND ANALYTICAL STUDIES OF THE SI-TI BINARY-SYSTEM
    GONG, SF
    ROBERTSSON, A
    HENTZELL, HTG
    LI, XH
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (09) : 4535 - 4541
  • [10] THERMODYNAMIC INVESTIGATIONS OF SOLID-STATE SI-METAL INTERACTIONS .2. GENERAL-ANALYSIS OF SI-METAL BINARY-SYSTEMS
    GONG, SF
    HENTZELL, HTG
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (09) : 4542 - 4549