FLATTENING THE SURFACE OF CAF2/SI(100) STRUCTURES BY POST-GROWTH ANNEALING

被引：30

作者：

ASANO, T

ISHIWARA, H

FURUKAWA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 07期

关键词：

D O I：

10.1143/JJAP.27.1193

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1193 / 1198

页数：6

共 19 条

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