A METHOD FOR DETERMINING SODIUM CONTENT OF SEMICONDUCTOR PROCESSING MATERIALS

被引：21

作者：

YURASH, B

DEAL, BE

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1968年 / 115卷 / 11期

关键词：

D O I：

10.1149/1.2410937

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1191 / &

共 21 条

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[7]

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[8] INVESTIGATION OF THERMALLY OXIDISED SILICON SURFACES USING METAL-OXIDE-SEMICONDUCTOR STRUCTURES [J].

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