FORMATION OF A DOUBLE-HETERO SI-COSI2-SI STRUCTURE USING MOLECULAR-BEAM AND SOLID-PHASE EPITAXIES

被引：20

作者：

SAITOH, S

ISHIWARA, H

FURUKAWA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 01期

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D O I：

10.7567/JJAPS.20S1.49

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：49 / 54

页数：6

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[7] DOUBLE HETEROEPITAXY IN THE SI (111)-COSI2-SI STRUCTURE
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