ELECTRONIC QUENCHING AND CHEMICAL-REACTIONS OF SIH RADICALS IN THE GAS-PHASE

被引:40
作者
NEMOTO, M
SUZUKI, A
NAKAMURA, H
SHIBUYA, K
OBI, K
机构
关键词
D O I
10.1016/0009-2614(89)87009-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
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页码:467 / 471
页数:5
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[31]   RATES OF REACTION OF PROPYL RADICALS WITH MOLECULAR-OXYGEN [J].
RUIZ, RP ;
BAYES, KD .
JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (12) :2592-2595
[32]   PRODUCTION MECHANISM AND REACTIVITY OF THE SIH RADICAL IN A SILANE PLASMA [J].
SCHMITT, JPM ;
GRESSIER, P ;
KRISHNAN, M ;
DEROSNY, G ;
PERRIN, J .
CHEMICAL PHYSICS, 1984, 84 (02) :281-293
[33]   QUENCHING OF OH (A 2-SIGMA+, V' = O) BY H2, N2O, AND HYDROCARBONS AT ELEVATED-TEMPERATURES [J].
SMITH, GP ;
CROSLEY, DR .
JOURNAL OF CHEMICAL PHYSICS, 1986, 85 (07) :3896-3901
[34]   WIDE FLUCTUATIONS IN FLUORESCENCE LIFETIMES OF INDIVIDUAL ROVIBRONIC LEVELS IN SIH2 (A1B1) [J].
THOMAN, JW ;
STEINFELD, JI ;
MCKAY, RI ;
KNIGHT, AEW .
JOURNAL OF CHEMICAL PHYSICS, 1987, 86 (11) :5909-5917
[35]   DEPOSITION OF SILICA FILMS BY THE OXIDATION OF SILANE IN OXYGEN .1. KINETICS AND PHYSICOCHEMICAL MODEL OF THE PROCESS [J].
VASILYEVA, LL ;
DROZDOV, VN ;
REPINSKY, SM ;
SVITASHEV, KK .
THIN SOLID FILMS, 1978, 55 (02) :221-228
[36]   EMISSION-SPECTRA OF SIH(A2-DELTA-]X2II) AND SICL2(A1B1-]X1A1) IN THE VUV PHOTOLYSES OF SILANE AND CHLORINATED SILANES [J].
WASHIDA, N ;
MATSUMI, Y ;
HAYASHI, T ;
IBUKI, T ;
HIRAYA, A ;
SHOBATAKE, K .
JOURNAL OF CHEMICAL PHYSICS, 1985, 83 (06) :2769-2774
[37]   FORMATION OF SILYLGERMANE BY A SILYLENE INSERTION REACTION IN THE INFRARED PHOTOCHEMISTRY OF MONOSILANE MONOGERMANE MIXTURES [J].
ZHU, P ;
PISERCHIO, M ;
LAMPE, FW .
JOURNAL OF PHYSICAL CHEMISTRY, 1985, 89 (25) :5344-5347