XPS AND XRD INVESTIGATIONS OF DY/SI INTERFACE

被引：18

作者：

GOKHALE, S

AHMED, N

MAHAMUNI, S

RAO, VJ

NIGAVEKAR, AS

KULKARNI, SK

机构：

来源：

SURFACE SCIENCE | 1989年 / 210卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(89)90104-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：85 / 98

页数：14

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