DEPOSITION AND CHARACTERIZATION OF ORGANOSILICON THIN-FILMS FROM TEOS+O-2 GAS-MIXTURE

被引：2

作者：

JANCA, J ^{[1
]}

NAVRATIL, K ^{[1
]}

BOCHNICEK, Z ^{[1
]}

PERINA, V ^{[1
]}

机构：

[1] ACAD SCI CZECH REPUBL,INST NUCL PHYS,CR-25068 PRAGUE,CZECH REPUBLIC

来源：

CZECHOSLOVAK JOURNAL OF PHYSICS | 1995年 / 45卷 / 10期

关键词：

D O I：

10.1007/BF01691397

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The composition of films deposited in RF glow discharge tubular reactor fed with tetraethoxysilane (TEOS) and oxygen mixtures at various temperatures, gas flows, gas pressures and various self-bias voltages were investigated by means of different diagnostic methods. The thickness, stress in thin films, hardness, composition and optical properties of deposited thin films were determined.

引用

页码：851 / 862

页数：12

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