VAPOR DEVELOPMENT OF PMMA RESISTS UNDER X-RAY-EXPOSURE

被引：7

作者：

LEHOCKEY, EM ^{[1
]}

REID, I ^{[1
]}

机构：

[1] UNIV WESTERN ONTARIO,FAC ENGN SCI,LONDON N6A 3K7,ONTARIO,CANADA

来源：

SURFACE AND INTERFACE ANALYSIS | 1988年 / 11卷 / 6-7期

关键词：

D O I：

10.1002/sia.740110606

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：302 / 306

页数：5

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