NEUTRAL AND ION-BEAM SIMS OF NONCONDUCTING MATERIALS

[51] MASSEY HSW, 1969, ELECTRONIC IONIC IMP, V4, P2116

[52] MASSEY HSW, 1952, ELECTRONIC IONIC IMP, V1, P631

[53] REDHEAD PA, 1968, PHYSICAL BASIS ULTRA, P132

[54] FAST-ATOM MOLECULAR SECONDARY-ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 54 (03): : 237 - 247

[55] ROSS MM, 1984, J VAC SCI TECHNOL A, V2, P758

[56] ENERGY-SPECTRA OF IONS SPUTTERED FROM ELEMENTS BY O-2+ - COMPREHENSIVE STUDY [J]. SURFACE SCIENCE, 1979, 82 (02) : 549 - 576

[57] THE DEPTH DEPENDENCE OF THE DEPTH RESOLUTION IN COMPOSITION DEPTH PROFILING WITH AUGER-ELECTRON SPECTROSCOPY [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (01) : 33 - 37

[58] Slodzian G, 1980, ADV ELECTRONICS E SB, V138, P1

[59] STANDING KG, 1986, SPRINGER SERIES CHEM, V44, P476

[60] A TIME-OF-FLIGHT MASS-SPECTROMETER FOR STATIC SIMS APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 1322 - 1325

[51] MASSEY HSW, 1969, ELECTRONIC IONIC IMP, V4, P2116

[52] MASSEY HSW, 1952, ELECTRONIC IONIC IMP, V1, P631

[53] REDHEAD PA, 1968, PHYSICAL BASIS ULTRA, P132

[54] FAST-ATOM MOLECULAR SECONDARY-ION MASS-SPECTROMETRY [J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1983, 54 (03): : 237 - 247

[55] ROSS MM, 1984, J VAC SCI TECHNOL A, V2, P758

[56] ENERGY-SPECTRA OF IONS SPUTTERED FROM ELEMENTS BY O-2+ - COMPREHENSIVE STUDY [J]. SURFACE SCIENCE, 1979, 82 (02) : 549 - 576

[57] THE DEPTH DEPENDENCE OF THE DEPTH RESOLUTION IN COMPOSITION DEPTH PROFILING WITH AUGER-ELECTRON SPECTROSCOPY [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (01) : 33 - 37

[58] Slodzian G, 1980, ADV ELECTRONICS E SB, V138, P1

[59] STANDING KG, 1986, SPRINGER SERIES CHEM, V44, P476

[60] A TIME-OF-FLIGHT MASS-SPECTROMETER FOR STATIC SIMS APPLICATIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 1322 - 1325