PLASMA POLYMERIZATION BY MAGNETRON GLOW-DISCHARGE .3. EFFECT OF MAGNETIC-FIELD ON SPUTTERING CHARACTERISTICS OF ELECTRODE MATERIALS

被引：8

作者：

CHO, DL

YEH, YS

YASUDA, H

机构：

[1] UNIV MISSOURI,DEPT CHEM ENGN,ROLLA,MO 65401

[2] UNIV MISSOURI,GRAD CTR MAT RES,ROLLA,MO 65401

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.576174

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2960 / 2965

页数：6

共 24 条

[1]

AISSEL LI, 1970, HDB THIN FILM TECHNO

[2] HIGH-RATE SPUTTERING DEPOSITION OF NICKEL USING DC MAGNETRON MODE [J].

CHANG, SA ;

SKOLNIK, MB ;

ALTMAN, C .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :413-416

[3] PREPARATION AND PROPERTIES OF GRANULAR ALUMINUM IN PLASMA-POLYMERIZED MATRICES [J].

HECQ, M ;

ZIEMAN, P ;

KAY, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :364-365

[4] PRESSURE EFFECTS IN PLANAR MAGNETRON SPUTTER DEPOSITION [J].

HELMER, JC ;

WICKERSHAM, CE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :408-412

[5] MAGNETIC FIELD EFFECTS ON AN ABNORMAL TRNCATED GLOW DISCHARGE AND THEIR RELATION TO SPUTTERED THIN-FILM GROWTH [J].

KAY, E .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) :760-&

[6] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].

LAEGREID, N ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&

[7]

LEAHY MF, 1987, SOLID STATE TECHNOL, V30, P99

[8] PLASMA POLYMERIZATION OF ETHYLENE BY MAGNETRON DISCHARGE [J].

MOROSOFF, N ;

NEWTON, W ;

YASUDA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (06) :1815-1822

[9] PLASMA POLYMERIZATION OF TETRAFLUOROETHYLENE .3. CAPACITIVE AUDIO FREQUENCY (10 KHZ) AND AC DISCHARGE [J].

MOROSOFF, N ;

YASUDA, H ;

BRANDT, ES ;

REILLEY, CN .

JOURNAL OF APPLIED POLYMER SCIENCE, 1979, 23 (12) :3471-3488

[10]

MOROSOFF N, 1979, ACS SYM SER, V108, P163

← 1 2 3 →